Advanced Energy Industries Inc
AEIS Real Time Price USDRecent trades of AEIS by members of U.S. Congress
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Recently reported changes in AEIS holdings by institutional investors
Quarterly net insider trading by AEIS's directors and management
* Insider trading data parsed from SEC Form 4 filings by Quiver Quantitative. Sign up for the Quiver API for real-time access.
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About
Key Metrics
Return (1d)
Return (30d)
Return (1Y)
CAGR (Total)
Max Drawdown
Beta
Alpha
Sharpe Ratio
Win Rate
Average Win
Average Loss
Annual Volatility
Annual Std Dev
Information Ratio
Treynor Ratio
Total Trades
Metrics Definitions
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Alpha
Measures a portfolio's risk-adjusted performance against that of its benchmark
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Annual Standard Deviation
Measures how much the portfolio's total return varies from its mean or average.
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Annual Volatility
A statistical measure of the dispersion of returns for the portfolio.
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Average Win
The average return (%) for trades that resulted in a positive return.
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Average Loss
The average return (%) for trades that resulted in a negative return.
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Beta
A measure of the volatility of the portfolio compared to the market as a whole.
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CAGR
CAGR (Compounded Annual Growth Rate), is the historical annualized rate of return for an investment strategy, throughout the backtest period.
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Information Ratio
A measurement of portfolio returns beyond the returns of its benchmark compared to the volatility of those returns.
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Max Drawdown
the maximum observed loss from a peak to a trough of a portfolio, before a new peak is attained.
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Sharpe Ratio
The Sharpe Ratio is a measure of historical risk-adjusted return, which quantifies the amount of return that an investor received per unit of risk.
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Total Trades
The total number of trades made by this strategy.
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Treynor Ratio
Attempts to measure how successful an investment is in providing compensation to investors for taking on investment risk.
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Win Rate
The percentage of total trades that resulted in a positive return.
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Government lobbying spending instances
AEIS Estimated quarterly lobbying spending
AEIS Revenue by Segment or Geography
New AEIS patent grants
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Patent Title: Noise based frequency tuning and identification of plasma characteristics Dec. 26, 2017
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Patent Title: Frequency tuning for pulsed radio frequency plasma processing Dec. 26, 2017
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Patent Title: Rate enhanced pulsed dc sputtering system Nov. 07, 2017
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Patent Title: Switching amplifier Oct. 31, 2017
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Patent Title: Power generator with frequency tuning for use with plasma loads Sep. 26, 2017
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Patent Title: Method of controlling the switched mode ion energy distribution system Sep. 19, 2017
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Patent Title: Apparatus for frequency tuning in a rf generator Aug. 29, 2017
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Patent Title: System and method for control of high efficiency generator source impedance Aug. 22, 2017
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Patent Title: System and method for balancing consumption of targets in pulsed dual magnetron sputtering (dms) processes Jul. 18, 2017
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Patent Title: Frequency tuning for pulsed radio frequency plasma processing Jul. 18, 2017
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Patent Title: Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system Jun. 20, 2017
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Patent Title: Arc management with voltage reversal and improved recovery Jun. 06, 2017
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Patent Title: Impedance-matching network using bjt switches in variable-reactance circuits May. 23, 2017
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Patent Title: Adjustable non-dissipative voltage boosting snubber network May. 16, 2017
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Patent Title: Charge removal from electrodes in unipolar sputtering system Apr. 11, 2017
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Patent Title: Systems, methods, and apparatus for minimizing cross coupled wafer surface potentials Mar. 07, 2017
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Patent Title: Systems and methods for obtaining information about a plasma load Feb. 21, 2017
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Patent Title: Apparatus for controlled overshoot in a rf generator Feb. 21, 2017
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Patent Title: Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages Jan. 31, 2017
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Patent Title: Frequency tuning for pulsed radio frequency plasma processing Jan. 10, 2017
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Patent Title: Reliable plasma ignition and reignition Jan. 03, 2017
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Patent Title: Electrostatic remote plasma source system and method Dec. 20, 2016
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Patent Title: Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages Dec. 13, 2016
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Patent Title: Three terminal pin diode Nov. 08, 2016
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Patent Title: Adjustable non-dissipative voltage boosting snubber network Nov. 01, 2016
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Patent Title: System level power delivery to a plasma processing load Oct. 25, 2016
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Patent Title: Wafer chucking system for advanced plasma ion energy processing systems Sep. 06, 2016
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Patent Title: Method of controlling the switched mode ion energy distribution system Jun. 07, 2016
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Patent Title: Impedance matching network with high frequency switching May. 10, 2016
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Patent Title: Arc management with voltage reversal and improved recovery Apr. 12, 2016
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Patent Title: System, method and apparatus for controlling ion energy distribution of a projected plasma Apr. 12, 2016
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Patent Title: Frequency tuning system and method for finding a global optimum Mar. 22, 2016
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Patent Title: Passive unipolar referencing for non-isolated inverters Mar. 15, 2016
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Patent Title: Charge removal from electrodes in unipolar sputtering system Mar. 15, 2016
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Patent Title: Method and apparatus for controlling ion energy distribution Mar. 15, 2016
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Patent Title: System, method and apparatus for controlling ion energy distribution Mar. 15, 2016
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Patent Title: Current threshold response mode for arc management Feb. 16, 2016
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Patent Title: Dual beam non-contact displacement sensor Jan. 05, 2016
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Patent Title: Adjustable non-dissipative voltage boosting snubber network Dec. 29, 2015
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Patent Title: Variable-class amplifier, system, and method Dec. 29, 2015
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Patent Title: Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages Dec. 29, 2015
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Patent Title: Systems and methods for calibrating a switched mode ion energy distribution system Dec. 08, 2015
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Patent Title: Method for controlling ion energy distribution Dec. 08, 2015
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Patent Title: Common mode filter system and method for a solar power inverter Oct. 27, 2015
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Patent Title: Methods and apparatus for sputtering using direct current Oct. 06, 2015
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Patent Title: Photovoltaic dc sub-array control system and method Sep. 29, 2015
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Patent Title: Systems and methods for islanding detection Sep. 22, 2015
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Patent Title: Capacitively coupled remote plasma source Sep. 22, 2015
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Patent Title: Differing boost voltages applied to two or more anodeless electrodes for plasma processing Sep. 08, 2015
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Patent Title: Rf power control device for rf plasma applications Nov. 15, 2011
Federal grants, loans, and purchases
Estimated quarterly amount awarded to AEIS from public contracts
Recent insights relating to AEIS
Recent picks made for AEIS stock on CNBC
ETFs with the largest estimated holdings in AEIS
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- Is $AEIS stock a Buy, Sell, or Hold?
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* Analyst consensus is not financial advice. Please see our data disclaimers .
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- Who owns $AEIS stock?
- Who owns the most shares of $AEIS stock?
- What funds own $AEIS stock?
* These are estimates based on data taken from SEC filings. There may be inaccuracies due to parsing errors, accidental double-counting, incorrect classification of indirectly owned shares, or any other number of issues.
The Quiver Smart Score combines our data on Congress Trading, Lobbying, Insider Trading, CNBC Mentions and more to provide a comprehensive view of the strength of a stock's underlying data.
The Smart Score grades stocks on a scale of 1 (weakest) to 10 (strongest) based on the strength of the underlying data.Sign Up to view AEIS Smart Score
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Example:
The Bulls Say summary highlights positive aspects of the stock.
The Bears Say summary points out potential risks and negative aspects of the stock.
Advanced Energy Industries Inc provides precision power-conversion measurement and control solutions that transform power into various forms for use in manufacturing and industrial equipment and applications. The firm serves original equipment manufacturers and end customers in the semiconductor, flat panel display, solar panel, and other industrial capital equipment markets. Products include thin-film power-conversion systems, which control and modify raw electrical power into a customizable, predictable power source, and power control modules, which control and measure temperature during manufacturing cycles. A majority of the firm's revenue is generated in United States, with the rest from Mexico, Taiwan, China and All others.
- Address Denver, CO
- Market Cap 7.4 billion
- Employees 10,000
- Industrial Classification Electronic Components, Nec